TSMC Outlines Path to EUV Success: More Tools, More Wafers, & Best Pellicles In Industry
Although TSMC can't claim to be the first fab to use extreme UV (EUV) lithography – that title goes to Samsung – they do get to claim to be the largest. As a result, the company has developed significant experience with EUV over the years, allowing TSMC to refine how they use EUV tooling to both improve productivity/uptime, and to cut down on the costs of using the ultra-fine tools. As part of the company's European Technology Symposium this week, they went into a bit more detail on their EUV usage history, and their progress on further integrating EUV into future process nodes.
When TSMC started making chips using EUV lithography in 2019 on its N7+ process (for Huawei's HiSilicon), it held 42% of the world's installed base of EUV tools, and even as ASML ramped up shipments of EUV scanners in 2020, TSMC's share of EUV installations actually increased to 50%. And jumping ahead to 2024, where the number of EUV litho systems at TSMC has increased by 10-fold from 2019, TSMC is now 56% of the global EUV installed base, despite Samsung and Intel ramping up their own EUV production. Suffice it to say, TSMC made a decision to go in hard on EUV early on, and as a result they still have the lion's share of EUV scanners today.