With High NA EUV,
Intel Foundry Opens New Frontier in Chipmaking Intel is industry’s first mover on High NA EUV, enabling continued process leadership beyond
Intel 18A.Intel Foundry reported a key milestone in advanced semiconductor manufacturing with completed assembly of the industry’s first commercial High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography scanner, located at the company’s Hillsboro, Oregon, R&D site. Intel’s TWINSCAN EXE:5000 High NA EUV tool from lithography leader ASML is now going through calibration steps in preparation for production of Intel’s future process roadmap. The new tool has the ability to dramatically improve resolution and feature scaling for next-generation processors by changing the optics design for projecting printed images onto a silicon wafer.
“With the addition of High NA EUV, Intel will have the most well-rounded lithography toolbox in the industry, enabling the company to drive future process capabilities beyond Intel 18A into the second half of this decade.”
–Mark Phillips, Intel Fellow and director of Lithography, Hardware and Solutions for Intel Foundry Logic Technology Development